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Finite-length mask effects in the isolation oxidation of silicon. (English) Zbl 0877.35139

Summary: A moving-boundary problem modelling the two-dimensional isolation oxidation of silicon is analyzed in the limit of reaction-controlled oxidation for a finite-length nitride mask. Encroachment under the mask caused by silicon oxidation then occurs from both sides to produce two ‘bird’s beaks’, and it is the interaction between these beaks on which attention is focused. This effect, termed ‘bird’s beak punchthrough’, is currently of interest in submicron silicon-isolation technologies.

MSC:

35R35 Free boundary problems for PDEs
35Q80 Applications of PDE in areas other than physics (MSC2000)
78A55 Technical applications of optics and electromagnetic theory
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